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PROGRAM
Sunday, September 27, 2015
19.00 – 22.00
Get-together Reception
19.00 – 21.00
Registration at Get-together Reception
Monday, September 28, 2015
8.00 – 18.00
Registration at Conference Venue
9.00 – 9.10
Opening
Challenges of ALD
Chair: Marek Godlewski
9.10 – 9.40
Markku Leskelä (University of Helsinki, Finland), „Recent challenges of ALD“
(Invited)
9.40 – 10.10
D. Longrie, D. Deduytsche, G. Rampelberg, Christophe Detavernier (Ghent
University, Belgium), "Thermal and plasma enhanced atomic layer deposition
on powders“ (Invited)
10.10 – 10.25
Christoph Hossbach (Technische Universität Dresden, Germany), Frank Stahr,
Martin Knaut, Varun Sharma, Alrun Aline Günther, Daniel Kasemann, Matthias
Albert, Johann W. Bartha, „Compact plasma source for direct and remote
plasma enhanced atomic layer deposition of conductive thin films“
10.25 – 10.40
Harm Knoops, Thomas Sharp, Annika Peter, Brodie Mackenzie (Oxford
Instruments Plasma Technology, Bristol, UK), Owain Thomas, Robert Gunn
„Low temperature plasma-assisted ALD of conductive films“
10.40 – 11.15
Coffee break
1
Design of processes and reactors
Chair: Markku Leskelä
11.15 – 11.30
Simon Elliott (Tyndall National Institute, University College Cork, Ireland) „How
to design and optimise a process for selective area ALD“
11.30 – 11.45
Katja Väyrynen (University of Helsinki, Finland), Ville Miikkulainen, Kenichiro
Mizohata, Väinö Kilpi, Mikko Ritala „Photo-ALD of tantalum and niobium
oxides“
11.45 – 12.00
Mikhael Bechelany (Institut Européen des Membranes, Université Montpellier,
France), „Atomic layer deposition: from nanomaterials to membranes
applications“
12.00 – 12.15
Timo Vähä-Ojala (Picosun Ltd., Finland), Niklas Holm, Satu Ek „Modelling of
carrier gas flow in ALD reactor“
12.15 – 12.30
Markus Bosund, Mikael Saarniheimo, Mikko Söderlund, Paavo Timonen
(Beneq Oy, Finland), ”Fast Large Area Plasma ALD Reactor“
12.30 – 13.45
Lunch
2
Characterization
Chair: Uwe Schröder
13.45 – 14.15
Massimo Tallarida, (ALBA Synchrotron, Barcelona, Spain) „Recent advances
and future directions in the investigation of ALD films with synchrotron
radiation“ (Invited)
14.15 – 14.30
David Cameron (Masaryk University, Brno, Czech Republic), Richard
Krumpolec, Tatiana V. Ivanova, Tomáš Homola, Mirko Černak, „Spectroscopic
ellipsometry of the nucleation of ALD titanium dioxide films“
14.30 – 14.45
Riikka Puurunen (Technical Research Centre of Finland, VTT), Saima Ali, Kai
Arstila, Maria Berdova, Eero Haimi, Hannele Heikkinen, Jaakko Julin, Lauri
Kilpi, Mikko Laitinen, Xuwen Liu, Jussi Lyytinen, Jari Malm, Alexander Pyymaki
Perros, Ville Rontu, Sakari Sintonen, Oili Ylivaara, Timo Sajavaara, Harri
Lipsanen, Sami Franssila, Jari Koskinen, Helena Ronkainen, Simo-Pekka
Hannula, Jyrki Kiihamäki, „Mechanical property mapping of ALD thin films“
14.45 – 15.00
Christoph Wiegand (Institute of Nanostructure and Solid State Physics,
Universität Hamburg, Germany), René Faust, Johannes Gooth, Monika Rusek,
Robert Zierold, Stefan Schulz, Kornelius Nielsch, „Characterization of ALD
grown GaxSb2-xTe3 thin films: Halosilylation based reactions for controlling the
transport properties“
15.00 – 15.15
Marianna Kemell (University of Helsinki, Finland), Elina Färm, Mikko Heikkilä,
Marko Vehkamäki, Mikko Ritala, Markku Leskelä „Atomic layer deposition of
As2S3 thin films“
15.15 – 15.30
Sanni Seppälä (University of Helsinki, Finland), Jaakko Niinistö, Kenichiro
Mizohata, Clement Lansalot-Matras, Wontae Noh, Mikko Ritala, Markku
Leskelä „Effect of oxygen source on film properties in ALD of lanthanum oxide“
15.30 – 16.00
Coffee break
3
Multifunctional films and coatings
Chair: Riikka Puurunen
16.00 – 16.30
Maarit Karppinen (Aalto University, Espoo, Finland) „Atomic/molecular layer
deposition for multifunctional inorganic-organic thin films“ (Invited)
16.30 – 16.45
Kristian Blindheim Lausund (University of Oslo, Norway), Steven R. H. Wilson,
Carl Henrik Gørbitz, Elsa Lundanes, Ola Nilsen „Deposition of organicinorganic hybrid films of Zr-1,4-BDC by ALD“
16.45 – 17.00
Väino Sammelselg (University of Tartu, Estonia) „ALD for advanced anticorrosion nanocoatings“
17.00 – 17.15
Taivo Jõgiaas (University of Tartu, Estonia), Roberts Zabels, Aile Tamm, Mikko
Heikkilä, Hugo Mändar, Kaupo Kukli, Mikko Ritala, Markku Leskelä,
„Mechanical properties of aluminium, zirconium, hafnium and tantalum oxides
and their nanolaminates grown by atomic layer deposition“
17.15 – 17.30
Claudia Wiemer (Laboratorio MDM, Milano, Italy), Alessio Lamperti, Silvia
Vangelista, Marco Fanciulli, Luca Lamagna, Stefano Losa, Raffaella Pezzuto,
Simon D. Elliott, Glen N. Fomengia, „Effect of the atomic layer deposition
process on the crystallization properties of Al2O3“
17.30 – 18.15
Poster session, coffee
18.00 – 19.00
Excursions to laboratories of the Institute of Physics, University of Tartu
20.00 – 23.00
Conference dinner
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Tuesday, September 29, 2015
8.00–16.00
Registration at Conference Venue
Complex nanostructures
Chair: Kornelius Nielsch
9.00 – 9.30
Nicola Pinna (Humboldt-Universität zu Berlin, Germany), Catherine Marichy,
„Carbon-metal oxides nanocomposites for energy and environmental
applications“ (Invited)
9.30 – 9.45
Carlos Guerra (Swiss Federal Laboratories for Materials Science and
Technology, Thun, Switzerland), Yucheng Zhang, Meng Li, Vipin Chawla, Rolf
Erni, Johann Michler, Hyung Gyu Park, Ivo Utke „Morphology and crystallinity
control of ultrathin TiO2 layers deposited on carbon nanotubes by temperaturestep ALD“
9.45 – 10.00
Lionel Santinacci (Aix Marseille Université, France), L. Assaud, N. Brazeau, M.
K. S. Barr, S. Ntais, M. Hanbücken, E. A. Baranova, „Atomic layer deposition of
Pd nanoparticles on TiO2 nanotubes for electrocatalytic oxidation of ethanol:
effect of the substrate“
10.00 – 10.15
Bruno Dlubak (Université Paris-Sud, France), M.-B. Martin, R. S. Weatherup,
H. Yang, C. Deranlot, K. Bouzehouane, F. Petroff, A. Anane, S. Hofmann, J.
Robertson, Albert Fert, Pierre Seneor „Sub-nanometer ALD for Spintronics in
Magnetic Tunnel Junctions Based on Graphene Spin-Filtering Membranes“
10.15 – 10.30
Erwan Rauwel (University of Oslo, Norway; Tallinn University of Technology,
Estonia), Augustinas Galeckas, Protima Rauwel, Per-Anders Hansen, David
Wragg, Helmer Fjellvåg, Ola Nilsen „ALD applied to conformal rare-earth
coating of oxide nanoparticles for low temperature thermal imaging
applications“
10.30 – 10.45
Alexander Hufnagel (Ludwig-Maximilians-Universität München, Munich,
Germany), Dina Fattakhova-Rohlfing, Thomas Bein „Nanostructured AZO
supports for photoelectrochemical water-splitting by atomic layer deposition
and hydrothermal methods“
10.45 – 11.15
Coffee break
5
Surface functionalization
Chair: Ola Nilsen
11.15 – 11.45
Sylwia Gieraltowska (Institute of Physics, Polish Academy of Sciences,
Warsaw, Poland), Lukasz Wachnicki, Bartlomiej S. Witkowski, Michal M.
Godlewski, Anna Slonska-Zielonka, Marek Godlewski, „Oxide thin films grown
by atomic layer deposition for antibacterial coatings“ (Invited)
11.45 – 12.00
Imre Miklós Szilágy (Budapest University of Technology and Economics,
Hungary), „Photocatalytic properties of crystalline and amorphous ALD TiO2
thin films“
12.00 – 12.15
Matti Putkonen, (Technical Research Centre of Finland, VTT), H.-L. Alakomi,
R. Malmberg, P. Willberg-Keyriläinen, E. Salo, M. Mäkelä, J. Niinistö, M. Ritala,
T. Gäddä, P. Simell, „Antimicrobial properties of ALD films“
12.15 – 12.30
Elisa Atosuo (University of Helsinki, Finland), Miia Mäntymäki, Mikko J.
Heikkilä, Kenichiro Mizohata, Mikko Ritala, Markku Leskelä „Lithiation of binary
oxides using atomic layer deposition and solid state reaction“
12.30 – 12.45
Janne-Petteri Niemelä (Aalto University, Espoo, Finland), Maarit Karppinen
“Transport properties of ALD-fabricated Nb-doped TiO2 thin films“
12.45 – 13.45
Lunch
6
Thin films for electronic applications
Chair: Kaupo Kukli
13.45 – 14.15
Karol Fröhlich (Institute of Electrical Engineering, Slovak Academy of Science,
Bratislava, Slovakia), Peter Jančovič, Ján Dérer, Edmund Dobročka, Boris
Hudec, Pauline Calka, Christian Walczyk, Gang Niu, Thomas Schroeder, I-Ting
Wang, Chung-Wei Hsu, Tuo-Hung Hou, „Atomic layer deposited films for next
generation resistive switching memories“ (Invited)
14.15 – 14.30
Salvador Dueñas (University of Valladolid, Spain), C. Vaca, H. Castán, H.
García, L. Bailón, M. B. González, F. Campabadal, E. Miranda, „Low
temperature resistive switching in Ni-HfO2-Si capacitors“
14.30 – 14.45
Halit Altuntas (Cankiri Karatekin University, Turkey), Cagla Ozgit-Akgun, Inci
Donmez, Necmi Biyikli, „A comparative study of the AlN dielectric films grown
by PA-ALD and HCP-ALD“
14.45 – 15.00
Ole Bethge (Vienna University of Technology, Austria), Christina Zimmermann,
Bernhard Lutzer, Jatinder Kauer, Emmerich Bertagnolli, „Re-growth of GeO2 in
between Atomic Layer Deposited high-k oxides and Ge surfaces for improving
the interface trap density“
15.00 – 15.15
Peter J. King (Newcastle University, UK), Srinivas Ganti, Erhan Arac, Anthony
G. O’Neill, „Interface engineering with ALD on germanium“
15.15 – 15.30
Uwe Schröder (NamLab GmbH, Dresden, Germany), T. Schenk, C. Richter, M.
Hoffmann, D. Martin, R. Materlik, A. Kersch, T. Mikolajick „Piezo- and
Ferroelectric Properties of ALD HfO2 Based Nanolaminates“
15.30 – 16.00
Coffee break
7
Thin films for electronic and optical applications
Chair: Simon Elliott
16.00 – 16.15
Silvia Vangelista (Laboratorio MDM IMM-CNR, Milano, Italy), C. Wiemer, A.
Lamperti, G. Tallarida, M. Fanciulli, Y. A. Matveev, A. Zenkevich, R. Mantovan,
„Atomic layer- and chemical vapor- deposition of multiferroic Er-Fe-O thin films“
16.15 – 16.30
Andy Thomas (Bielefeld University, Germany), Savio Fabretti, Robert Zierold,
Carmen Voigt, Carsten Ronning, Patrick Peretzki, Michael Seibt, Kornelius
Nielsch, „Atomic layer deposited HfO2-based magnetic tunnel junctions“
16.30 – 16.45
T. Jaehrling, Peter Basa, (Semilab Semiconductor Physics Laboratory Co. Ltd.,
Budapest, Hungary), Cs. Buday, Zs. Baji, Z. Szabó, J. Volk „Electrical and
optical characterization of Ga-doped ZnO layers adapted for optoelectronics
application“
16.45 – 17.00
Michael Getz (University of Oslo, Norway), Per-Anders Hansen, Helmer
Fjellvåg, Ola Nilsen, „Down conversion in YbVO4 and YVO4:Yb3+, Eu3+ thin
films synthesized by atomic layer deposition“
17.00 – 17.15
Ana Zuzuarregui (CIC nanoGUNE Consolider, San Sebastian, Spain), KlausDieter Bauer, Roland Steim, Laura Martinez-Sarti, Henk J. Bolink, Mato Knez,
„Highly efficient encapsulation of organic opto-electronic devices utilizing ALD“
17.15 – 17.30
Jan Keller, Johan Lindahl, Marika Edoff, Lars Stolt, Tobias Törndahl (Uppsala
University, Sweden), „An all atomic layer deposition window layer structure for
increased photocurrent generation in CIGS solar cells“
17.30 – 17.40
Closing
17.45 – 19.15
City Excursions
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