UHV Vacuum Techniques: Basic Concepts Lecture Contents Lecture 1: Basics Aims: ● ● What you ought to know about using vacuum What you might need during your PhD ● A quick starter for using vacuum equipment ● Cover entire range of vacuum - not just UHV ► Levels of vacuum and subsequent applications ► Modelling gas flow ► Pressure measurement atmosphere to UHV References ● ● ● Two excellent books: ► “Basic Vacuum Technology”, A. Chambers, R.K. Fitch and B.S. Halliday. ► “A Users Guide to Vacuum Technology”, O'Hanlon. Vacuum equipment manufacturers: ► Catalogues, websites ► e.g. Leybold, Edwards, Varian, Pffeiffer, Alcatel etc. Local knowledge (valuable, but finite resource!): ► workshops ► group technical support staff Lecture 2: Achieving Vacuum ► Vacuum pumps ► Pump configurations ► Types of chambers and fittings ► Complete systems Why know about vacuum? ● Nearly everyone here needs to know a little about vacuum: ● Many people here will use vacuum systems: ► e.g. most research groups use vacuum to some extent ► vacuum used very widely in modern experimental physics ► ► mostly simple physical principles involved need to understand the systems ► might need to analyse what is happening or design modifications ► what is achievable with today's technology ► the basics - so its easier to go away and find out more Historical Perspective BC 1657 1900 Ancient Greeks - Vacuum “inconcievable” Magdeburg Hemispheres Experiment 1950's What is the equipment like? Ultra High Vacuum (~10-10 mbar) 2000+ Rough Vacuum (~10-1 mbar) Manufacture of Lightbulbs Mercury Sealed Pumps Ultra High Vacuum Surface treatment research to achieve XHV Hydrocarbon Sealed Pumps Some Definitions Assume the vacuum system is a sphere... Units: ► Usually ► 1000 use mbar (although Pa are SI, sometimes Torr) CHAMBER (GAS) 5 mbar = 1 atm = 10 Pa = 760 Torr PUMP Levels of Vacuum: ► Low Vacuum ► Medium ► High ► Ultra Vacuum Vacuum - 1000 mbar to 1 mbar - 1 mbar to 10-3 mbar - 10-3 mbar to 10-8 mbar High Vacuum - ► eXtreme High Vac. - -12 10 -8 mbar to 10 mbar Kinetic Theory: reasonably valid ● Maxwell Boltzman Distribution v= ● Mean free path = below 10-12 mbar ● 8kT m 1 2 d2n Impingement Rate nv J= 4 For nitrogen at 295K: n (litre-1) λ J (cm-2s-1) 1000 2.5x1022 66 nm 2.9x1023 1 2.5x1019 66 µm 2.9x1020 1x10-3 2.5x1016 66 mm 2.9x1017 1x10-6 2.5x1013 66 m 2.9x1014 1x10-10 2.5x109 660 km 2.9x1010 P (mbar) Applications Low Vacuum: ► Ultra high vacuum (UHV): mechanical handling Medium vacuum: ► industrial processes ► vacuum drying/packaging ► vacuum distillation ► keeping surfaces clean for hours (surface science, epitaxial growth) ► space simulation (~10-10 mbar at 1000 km) ► Elementary Gas Transport ● Throughput, Q, is the volume of gas passing through an area per second at a specific temperature and pressure: Q= p achieving ultra high purities (e.g. for fusion) ► ● Conductance is a geometric property, which represents the ability of a gas to flow from a pressure gradient: dV dt C= Q P 2 P1 units, e.g. mbar.l/s C High vacuum (HV, λ>d): ► ► Extreme high vacuum (XHV): e-beams (welding, TV) ► storage rings ► ultra pure growth vacuum evaporation or coating ● S= Modes of Gas Flow ● Fluid flow is described by the Reynolds number and the Knudsen Number (both dimensionless) u D Kn= D R e= For vacuum systems: ● for round pipes ρ = density u = stream velocity D = diameter λ = m.f.p. ● Flow is only turbulent at very high pressures and pumping speeds (e.g. during initial evacuation, if unthrottled) Viscous flow and the transitional regime are important at high pressures (above about 10-3 mbar) ► ● ● Turbulent flow if Re>2000, laminar if Re<1200. Viscous flow if Kn<0.01, molecular flow if Kn>1. ● Volumetric flow rate often called the speed, S: p1 dV Q = dt p S Molecular Flow ● dominant for HV and UHV and well understood ● particles flow in all directions to reach dynamic equilibrium ● pumps 'wait and catch' gas particles high vacuum pumps do not 'suck' PUMP gas can be 'sucked out' Molecular flow dominant below about 10-3 mbar in 'normal' sized chambers. ► gas flows through random collisions with walls p2 Q Particles scattered from surface with cosine distribution to surface normal (Knudsen's cosine law) Molecular Conductance of an Aperture Net flow through an aperture corresponds to the rate of impingement from both sides: ● P 1, n1 Q=k T J 1J 2 A = C 0= Conductance of Pipes calculating conductance of pipes give same results (see O'Hanlon for details) P2, n2 ● kT p p A 2 m 1 2 A J1 J2 ► C0 = 11.8A l/s (A in cm2) for nitrogen (air) at room temp. ► need to account for gas and temp. ● For conductances in series, add reciprocally: ► ● 1/CT = 1/C1 + 1/C2 + 1/C3 12.4 D / L CS= l/s 14D /3L (D, L in cm) for nitrogen (air) at room temperature. C L=12.4 D 3 / L l/s ● Accurate to about 10% Effect of Conductance on Speed of a Pump Conductance, C For conductances in parallel, add normally ► C 0×C L C 0C L 3 ● (D, L in cm) for nitrogen (air) at room temperature. Combining Conductances For short pipes is convenient to reciprocally add the conductances for a long pipe and equivalent aperture: CS= ● conductance depends on (T/m)1/2 For long pipes (L>>D): 3 D 2k T C L= 6L m kT A 2 m ► ● Various methods for CT = C1 + C2 + C3 C1 CHAMBER C1 C2 C3 PUMP PUMP C2 C3 ● this assumes the volumes are independent - need to be careful Effective pumping speed at chamber is reduced by conductance of any connecting pipe The molecular conductance of the entrance aperture determines maximum speed of any pump Viscous and Transitional Flow Molecular ● Transitional Conductances of Complex Shapes Viscous higher pressures in pipes to mechanical pumps mean transitional and viscous flow may be important ● conductance increases with pressure ● important in connections to mechanical pumps - can use smaller connections ● accurate calculations complex ● results tabulated - often in mfr's catalogues ● Monte Carlo simulations required in general ● Refer to O'Hanlon for simple 'standard' shapes ● Quite often, just need approximate value ► can get quite a long way using simple approximations Approximate conductance is the conductance of the two apertures, added reciprocally... From BOC Edwards Catalogue A closer look at a generic system... Outgassing: gradual loss of particles adsorbed on walls of the chamber water is the major problem. ● CHAMBER Backstreaming: many pumps can lose fluids into the vacuum system, causing contamination, which can be difficult to remove. Outgassing Real Leak: a fine passageway to the air outside. Quantitative Description of Pumping Leak PUMP V Process Backstreaming Evaporation Virtual Leak: usually a small trapped volume, which acts like a real leak, but will deplete with time. Evaporation: liquids (and greases) will limit the vacuum until evaporated. (Clean components and WEAR GLOVES!) QT = QP + QO + QL + QVL + QE + QB ● dp =Q T Sp dt Ultimate pressure (dp/dt=0) pressure is simply p = QT / S ► ● Initial Air Virtual Leak Constant volume system governed by ● i.e. change in gas in chamber, d(pV)/dt is load minus gas removed by pump Solving fully requires detailed knowledge of QT - not generally available ► evaporation and outgassing of range of gases gives complex behavior... ● in the case of a leak, QT~QL For initial pumpdown, QL is not important, so we obtain p = p0 exp { -t / (v/S) } ► easy to calculate initial pumpdown times using the pumping speed at the chamber Limit of Pressure - Outgassing ● ● made up of general 'grot', greases, water vapour etc. log (pressure) ● outgassing limits vacuum in a clean, leaktight HV/UHV chamber for UHV, must accelerate degassing of water by baking to ~200°c for ~24 hours ► ● ► rule of thumb: rate doubles for every extra 10°c ► can get to UHV in days instead of years what is the ultimate limit? ► log(time) desorption is activated with Boltzmann factor diffusion of H2 through chamber walls Measurement of Pressure ● Require a measurable property which changes (linearly) with pressure, preferably independent of gas type ● No single principle is good between atm. and UHV. Pressure (mbar) ● In practise, integrated systems now widely available ► almost 'plug and play' ► connect to PC for logging ► can link to pump controllers combined pirani & ion gauge ► measure from atm. to UHV ● Sense pressure by mechanical deformation ● Measure total pressure independent of gas type ● Capsule gauge: ► Still need care in operation - e.g. responses different for different gases ● ● e.g. integrated ion gauge and controller 10-3 10-6 10-9 10-12 Mechanical Total Pressure Gauges Composite gauge heads can measure over wide ranges ► 100 Capsule gauge Diaphragm Pirani (thermal cond.) Capacitance manometer Spinning rotor Penning Bayard-Alpert (Ionis.) Inverted Magnetron Extractor Ion RGA Mass Spec. Vacuum Gauges ● 103 ► simple mechanical lever from expanding capsule to dial ► good for 1-1000 mbar Diaphragm gauges ► sense by mechanical deflection ► sense by change in capacitance, very accurate and good to 10-5 mbar, but expensive Capsule Gauge Annular electrode Disc electrode Diaphragm pressure under measurement Chemical Getter Capacitance Manometer Bayard Alpert Ion Gauge - HV and UHV Pirani Gauge - Low to Medium Vacuum ● ● ● RF ● hot filament emits electrons, which are attracted to grid and spiral around ● electron impact ionised residual gas inside grid ● positive gas ions reach collector and are detected by electrometer RC V Heat Loss ● measures thermal conductivity from hot wire to surroundings through vacuum typically set up in bridge arrangement with a compensating filament, and calibrated at HV 'standard' backing line gauge, cost few £100 needs calibrating to atm. and high vacuum ● usable between about 10-3 and 10-11 mbar, cost ~£1000 ● limited by x-rays from grid 10-4 1 Pirani gauge and controller P (mbar) ● cold cathode ionisation gauge - no filaments to blow ● single ion initially created spontaneously (e.g. cosmic ray) ● ● electrons attracted to anode, but crossed B and E fields cause long spiraling paths electrons cause further ionisation to maintain a stable discharge n ion current given by i = kp where k and n are constants, and 1.1<n<1.2 B ● ● ► emission current ionisation probability of gas Typical Correction Factor 0.16 1.0 1.4 2.4 5.8 Inverted Magnetron Gauge +2kV ● geometry of gauge ► Penning Gauge ● Gas He N2 CO2 Xe C6H6 Response of gauge depends on: ► 180 V 30 V response non-linear, so not regarded as so accurate some pumping effect robust, widely used gauge (industrially) for range 10-3 to 10-7 mbar ● similar principle, but works down to ~10-10 mbar ● single initial ionisation event few gives electron ● electrons perform cycloid motion in crossed E and B fields, ionising gas within kV ● produces stable discharge similar to Penning gauge ● some pumping effect ● considerable sputtering at high pressures (avoid >10-5 mbar for long periods deposits can cause leakage currents) B ● provides alternative to ion gauge ► no filaments to blow ► no light, no heating ► but, slow to start at low pressures and requires big magnet Precision Vacuum Gauges ● ● most gauges are only accurate to ~20% at best (often worse) ● wide variety of pumps used at all pressure levels ● concentrate on main types of pumps used in research a few 'precision' gauges are available ► ► ● Vacuum Pumps All Vacuum Pumps capacitance manometer (limited to ~10-5 mbar) Gas Transfer spinning rotor gauge (limited to ~10-7 mbar) Positive Displacement precision gauges are expensive, and limited range but can be used to calibrate ion gauges etc. when pressure critical Spinning Rotor Gauge Kinetic Entrapment Moving components displace and eject a volume of gas. Momentum imparted to individual gas particles, driving them to exhaust e.g. reciprocating piston or rotating vanes e.g. rotor in a turbomolecular pump Gas particles react chemically and trapped, or ionised, accelerated and embedded in pump walls. Vacuum Pumps Viscous Flow Rotary Vane Pump Molecular Flow ● 'standard' mechanical pump, used to achieve rough vacuum ● sliding vanes rotate, compressing and ejecting gas to atmosphere ● sealed with oil Pressure (mbar) 103 100 10-3 10-6 10-9 Mechanical (Rotary) Pump Diffusion Pump Turbomolecular Pump 10-12 ► needs replacing periodically ► need foreline trap to keep oil from backstreaming into inlet lines ► special oils available for pumping oxygen/aggresives else BANG! Single stage rotary vane pump Rotary Vane Pump Rotary Vane Pump Flexible pipeline to chamber ● Foreline trap (catches oil in adsorbant beads regen. periodically) Inlet Connection (to chamber) Exhaust conn. (always exhaust to roof/outside SAFETY ISSUE) Oil sight glass Motor Pump housing (oil casing) 2 stage pump gives better ultimate pressure ► ● difficult to expel condensables ► e.g. water vapour ► gas ballast helps (leak air in between stages) ● typically get down to 2x10-3 mbar with a good rotary pump ● pumping speeds between about 0.5 and 80 m3/hr ● cost ~£1000 for few m3/hr 'Dry' Pumps can avoid contamination altogether with dry pumps, if necessary ► ● e.g. silicon wafer processing several mechanisms available, e.g. diaphragm, PTFE sealed pistons ● Dry pumps generally: ► lower pumping speed for same size or cost ► poorer ultimate pressures ► more expensive ► noisier Two stage rotary vane pump Other mechanical pumps ● ● 2 stages in series ● Other mechanical pumps are available, e.g.: ► piston pumps ► roots pump 15cm dia. inlet flange Roots pump Piston pump Usually designed for high pumping speeds needed in industry Principle of a roots pump Large roots and piston pumps used on a helium beam source Getting to High Vacuum ● ● ● Need different type of pump to get below about 10-3 mbar Diffusion Pump Chamber ● boils highly refined, high molecular weight fluid ● vapor jets impart downward momentum to gas entering pump ● oil condenses on water cooled body & recycled ● Discharges to rough vacuum Usually means using either: ► diffusion pump ► turbo pump <10-6 mbar HV Pump High vacuum pumps can't discharge to atmospheric pressure ► ► ~10-2 mbar Backing Pump permanently need a rotary pump as a 'support' or 'backing' pump 1000 mbar Vent to roof ● reliable 'standard', gets down to between ~10-7 and ~10-11 mbar depending on setup Diffusion Pump ● ► ► ● ● Diffusion Pump: Chevron Baffles Ultimate pressure depends on quality of fluid used ► cheap fluid (e.g. Corning DC704) ~10-6 mbar Inlet baffle ● all diff pumps backstream pump fluid when hot ● cold, optically dense baffle catches oil, but reduces the pumping speed good fluid (e.g. Edwards L9) ~ 10-9 mbar best fluid (Santovac 5) ~10-10 mbar (with baffle) Different fluids have different safety issues Need chevron baffle to catch backstreaming pump fluid and achieve best pressures ● Thermal Sensor Water cooling Heater 'critical backing pressure' ~0.5 mbar (depends on model) Liquid N2 reservoir To rest of system need liquid nitrogen temp. to reduce vapour pressures to UHV level ► once nitrogen reservoirs filled, need to be kept filled ► internal water condensation can refreeze in cracks and cause leaks To diffusion pump Optically dense chevron baffle, connected to cold reservoir Diffusion Pump Advantages: Disadvantages: ● fairly cheap (start ~£1000) ● reliable - little to go wrong ► ► heater is replaceable ► ► cooling coils can be descaled ► ● Turbomolecular Pump can take to bits and scrub out inside ● slow to start and stop fast moving rotors and stators impart momentum to gas molecules ● frequencies of up to ~1000 Hz ● high precision greased/oiled or magnetic bearings ~½ hr to warm up ~1 hr to cool down before venting ● expensive to run large pumps (£1000s per year) ● require liquid nitrogen baffles for true UHV (require daily filling!) ● Dependant on cooling water – MUST BE INTERLOCKED often found 'lying around' lab ● Turbomolecular Pump ● ● Advantages: pumping speed varies with gas and pressure compression varies with molecular mass ► typically 109 for N2 ► typically ~104 for He ► ● Turbomolecular Pump 3 typically ~10 for H2 difficult to remove lighter gases ► ► can add extra pump in series to improve compression add chemical pump in parallel to pump reactive species (e.g. H2) Chamber Getter Pump ● quick to start and stop ● low electrical costs ● clean – completely so for a mag-lev - no baffles required ● Turbo Pump ● Turbo Pump Backing Pump much more expensive to buy and service (typically around £10 000) ● occasional catastrophic failure ► something dropped in top ► bearing seizes water cooling much less critical ► magnetic controller fails ► ● ● can mount in more orientations ► Vent to roof Disadvantages pump should turn off if too hot, usually after >1/2 hr air cooling options available mag-lev turbos good for aggressive gases ● need to be well secured (SAFETY RISK) ► e.g. Leybold T1600 has to be secured to withstand an impact torque of 20 000 Nm Ion Pump ● ● ● ● ● Getter Pump ● type of entrapment pump, operating like a series of Penning gauges Ion pump cell ● electrons spiral in strong magnetic field, ionising gas species on impact ions are accelerated to and get buried in surface of anode Choice of pump depends on ► ► level of vacuum size of chamber (outgassing) ► gas throughput of process ► pumpdown time ► type of gas (nasty?) ► level of cleanliness required ► size and positioning ► finances available (!) ► ... ● ● careful consideration and risk assessment is vital number of big mfrs.: ► never pay list price for new vacuum equipment ► discounts of up to ~50% are routine for academia ► blocks of reactive, sintered material (NEG) limited capacity - has to be used at very low pressures, e.g. in a load-locked chamber ● cannot pump inert/rare gases Choice of Pumps ● sublimated coatings (TSP uses Ti/Mo alloy) ● B needs additional pump to get down to about 10-4 mbar before ion pump will start ► particularly good at pumping H2, unlike many other pumps -kV ● use strip getters along entire length of particle accelerator beamlines to achieve XHV ● once activated, pumps without power - portable! various types of getter ● +kV clean pumping to UHV, but requires large magnet chemical 'getter' pump, reacts with and contains reactive elements Low to High Vacuum Fittings High vacuum fittings: ● elastomer seals ● usually use KF (Klein Flange) fittings with o-rings Ultra High Vacuum Fittings metal flange To achieve UHV: ● ● not difficult, just need to do the job properly and cleanly ● require materials which are not gassy ► all metal fittings, plus ceramics, glass(fibre), PTFE ► no plastics, adhesives, solder, brass ► ● Need electrical, fluid and mechanical connections to experiment ► commercial feedthroughs ceramic insulator ● Electrical connections ► ceramic to metal seals ► delicate - avoid bending pins! vacuum side Electrical feedthrough metal bellows to allow motion in vacuum http://outgassing.nasa.gov usually use CF (Conflat) knife edge flanges and copper gaskets ► Vacuum Feedthroughs ● can seal with elastomer gaskets temporarily (indicate by using few bolts) Knife Edge Vacuum Valves Diaphragm valve (typically on backing lines) Butterfly valve (high conductance) HV 90° valve Mechanical connections ► o-ring sealed for HV ► differentially pumped or metal bellows sealed for UHV Push-pull linear feedthrough Putting it all together UHV 90° valve Gate valve (high conductance + UHV) Standard Vacuum Symbols Vacuum Pump, General Adsorption Pump Rotary Vane Pump Cryopump Diffusion Pump Another Simple System Manual Valve Variable Leak Valve UHV Chamber Getter Pump Electromag. Valve Roughing Line UHV Gate Valve Sputter-Ion Pump Turbo Pump Sorption Trap Turbomolecular Pump Getter Pump Vacuum Gauge Backing Line ● Design system carefully Then, if you have problems... ● ● ● ● Avoid contamination ► degrease and clean all components ► assemble with clean gloves ● ● Try to identify source of contamination Cleaning How-To ● ● Check system processes Check system design and construction Locate and address leaks ► Bake the system to achieve UHV ► a single unsuitable component will limit the pressure achieved avoid gassy materials Exhaust to roof Leak Test Reaching the Ultimate Pressure Normal procedure: Exhaust to roof All Metal Valve Cold Trap ● Not very exciting, but very important to achieving good high vacuum performance Specialist cleaning possible for certain materials ► ceramics, glass ► see textbooks Some components difficult to clean: ► ► A generic procedure: 1. Start with 'mechanical cleaning' (scrub with detergent) 2. 'Buzz' in detergent in ultrasonic cleaner for 5-15 minutes. 3. Rinse in clean tap water 4. Rinse in deionised water clean as well as possible by hand 5. Dry carefully then use ultrasonic cleaner 6. Rinse in solvent ● Need to work out the source of the gas to fix the leak ► seal off system, monitor pressure ► leak test ► analyse gases in chamber pressure Fix real leaks: ► re-seal leaking flanges ► re-weld crack in welding (avoid leak-sealant!) ► leak-seal cracks in feedthrough connections virtual leak pressure pressure Two common approaches ► ► ● apply acetone + look for ANY pressure change Chamber ► connect up and spray Helium around potential leaks ► versatile technique, used widely outside 'vacuum field' Difficult to 'degas' - can take a long time ● Avoid creating virtual leaks by careful design in the first place: ► use internal welding ► vent trapped volumes directly ► drill screw holes right through 1. First try to detect the leak with acetone 5. Use as little helium as possible 2. Connect the leaktester to the system (~4 helium leak testers around Cavendish) 6. Ventilate the area 1. use a leak test port, or use mass-spec helium leaktester Helium leak-tester is a simple mass-spec designed to detect helium ● Helium Leaktest How-To Helium ● Almost VITAL to have some leak testing facilities especially at UHV level Trapped volumes of air (or other gas / vapour) constitute a virtual leak both Helium Leak Testing ● ● real leak time ● Often present - is it important? time ● Virtual Leaks time Leaks HV Pump Helium Leak Tester 2. replace one of the backing pumps 3. Apply a fine jet of helium from a leak test cylinder (borrow from liquifier facility) Backing Pump 4. Follow response of leaktester over period of 10's of seconds (depending on pumping path) 7. Work from the top down 8. Isolate sections of vacuum system in plastic bags 9. If gas load is small, divert entire backing load through leaktester, to maximise response. 10.Once leak identified, locate its position precisely to help fix it Bakeout ● Bake On Generally necessary to achieve p < 10-8 mbar without waiting too long ● Bake for as hot and as long as possible! ● Max. temperature determined by components ► Viton seals limit ~150°c ► PTFE limit ~200°c ► All metal systems are OK to higher temperatures Bakeout How-To Bake Off 1. Check that the components in the system are OK for baking & decide on max. temp. 2. Disconnect all non bakeable connections/fittings and store 3. Wrap sensitive components (feedthroughs, windows) in foil. 4. Position thermocouples at various characteristic points of the system (test them now!). 5. Either: Baking allow UHV to be reached in days, rather than months or years 1. Wrap chamber in heating tape and several loose layer of foil RGA Mass Spectrometer 2. Enclose chamber in custom made oven 6. Do final check on bake zone 7. Slowly increase temperature to e.g. 200°c for 24 hours (heat up over a period of a few hours) 8. Monitor temperatures and ensure an even heat - avoid cold spots 9. Hold at temperature until pressure sufficiently low 10.Cool down over a few hours 11.Degas filaments while chamber still warm RGA of a High Vacuum System 18 - water, chamber needs baking Residual Gases mass filter ioniser ion counter 4 (He), from process, or diffusing through elastomer gaskets control electronics ● ● Provides lowest pressure measurements - down to pp. of ~10-15 mbar ● allows analytical measurements and diagnosis provides pressure breakdown by mass number ● modern systems are run from a PC ● start at ~£5000 28, 32 - N2 (or CO) and O2, suggest a leak to atmosphere only 2 (H2), 28 (CO) and 44 (CO2) should be present in clean, leaktight UHV Forest of peaks around 40-70 suggests pump oil contamination (fit baffle or trap to pump) Cracking Patterns ● ● Do: different species give different mass patterns ► ● Good Working Practice for HV / UHV ● cracking, isotopic abundances etc. allows individual components to be identified ► understanding a process ► diagnosing contaminants ● cracking patterns tabulated by RGA mfrs. and in O'Hanlon Species Hydrogen Helium Methane Water Argon Acetone Mass 2 4 16 18 40 43 Abund. 100 100 100 100 100 100 Mass 1 2 15 17 20 58 Abund. 2.7 0.12 83 27 5.0 27 Mass 3 Abund. 0.31 14 16 36 27 15 3.1 0.36 8.0 keep a log of the behavior of system - it can help identify problems record reference RGA spectra of the chamber, if possible ● vent system to dry nitrogen ● open smallest flanges possible (keep under slight overpressure of nitrogen?) ● ensure regular maintenance on pumps (if possible!) - no one else will! Don't: ● vent HV / UHV systems with air ● vent system while components are cold (e.g. nitrogen traps, cryopumps) ● handle any components without gloves ● get any fluid/oil on your skin ● burn yourself on diff. pumps(!)
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