Outline How to Detect a Single Virus A. J. Flewitt 1, L. Garcia‐Gancedo 1, W. I. Milne 1, G. M. Ashley 2, J. K. Luo 2, X. Zhao 3, J. R. Lu 3 1 Electrical Engineering Division, Cambridge University 2 Centre for Material Research and Innovation, University of Bolton 3 Department of Physics, University of Manchester Motivation: lab‐on‐a‐chip • • • • Motivation Existing Biosensors Film Bulk Acoustic Resonator (FBAR) Devices Improving FBARs • Piezoelectric Materials: HiTUS Supttered ZnO • Electrode Materials: Carbon Nanotubes • Overall Performance • Conclusions Biosensor Requirements and Classes Requirements for high quality biosensors: • Early disease diagnosis • Point‐of‐care testing • Parallel testing Lab‐on‐a‐chip • • • • Cheaper Faster Greater sensitivity New clinical measurements 1) Very sensitive with a low mass detection limit 2) Easy to use 3) Low cost 4) Robust 5) Disposable Biosensor classes: 1) Optical based detectors 2) Electrochemical detectors 3) Cantilever based detectors 4) Acoustic wave based detectors Existing Acoustic Biosensors: QCM SAW Biosensors: Detection of PSA A Quartz Crystal Microbalance (QCM) measures a mass per unit area by measuring the change in frequency of a quartz crystal resonator. The resonance is disturbed by the addition or removal of a small mass QCM have a mass detection limit of a few nanograms, limited by low operation frequency (5 to 20 MHz) due to substrate thickness Reflection signals Detection of PSA concentration by Frequency changes D. S. Lee et al., IEDM Conf. Proc. (2007) 1 Standard FBAR structure Additional various types of sensing layers ZnO thin films (BE contact hole) • Zinc oxide (ZnO) has received significant attention due to its high piezoelectric coefficient kT and its strong adherence to various substrates • For application in acoustic wave devices, ZnO films must have the following properties: Top electrode Bottom electrode Piezoelectric film Oxide layer (DRIE stop) Si Ordered crystalline structure – good piezoelectric properties Trench DRIE Smooth surface – surface roughness decreases Q Oxide layer High deposition rate – films thicker than 2 µm are needed • Finite Element Simulation is a key tool for optimising devices Low stress – possibility of using plastic substrates • Fast prediction of the frequency response of FBAR devices • Multiple electrode configurations can be tested within a few days (compared to months of equivalent lab work) • Significant decrease of fabrication costs (due to less lab work needed) High resistivity as mobile charges reduce piezoelectric transduction Cost effective, repeatable results Sputtering HiTUS Sputtering System Very easy growth technique Easy to optimise Established technology Low cost Ion energy is dependent on rf power Samples are also exposed to the ion bombardment plasma 5 8 7 8 7 High target utilisation High deposition rate 8 6 1 2 3 4 5 6 7 8 9 10 Sputter target 3 Shroud Shutter Sample stage 13.56 MHz rf power supply Matching network Mass flow controllers Valves Turbo pump 8 10 Ordered crystallographic orientation 2 3 4 5 6 7 8 9 10 Shutter 3 0 70 80 This is over 1 order of magnitude smaller than magnetron sputtered films Resistivity 55 Deposition rate 6 10 45 -1 Deposition Rate (nm min ) Smooth surface Resistivity ( m) ZnO (004) ZnO (202) 8 10 ZnO film stress (GPa) 75 Surface roughness RMS <10 nm for 3 µm films 50 60 2 (deg.) 14 14 65 2 40 8 9 High resistivity and deposition rate Si (004) 10 10 30 2 1 12 13 15 10 4 3 11 10 10 8 15 3 Sputter target Earth shield Gas ring 11 Rotating sample stage 13.56 MHz rf power supply Matching network Mass flow controllers Valves Turbo pump 10 Flewitt, A.J., et al., Semicond. Sci. Technol., 24, 085002.1 (2009) 10 Intensity (a.u.) 13 1 Reduced sample ion bombardment 8 360 nm 800 nm 1390 nm 2200 nm 2800 nm 7 8 High resistivity films (>109 m) are achieved while keeping high deposition rates (>50 nm min‐1) FWHM rocking curve <4° (very small angular dispersion of the crystallites around the c‐axis) ZnO (0002) 8 ZnO characterisation c‐axis normal to the substrate 6 7 4 12 9 8 6 5 Sample removed from sputtering plasma 4 ZnO characterisation 10 O2 Gas 99.999% Independent control of plasma density and sputtering ion energy Excellent control of material properties including stress 2 1 Ar Gas 99.999% 2 1 Magnetron sputtering - as deposited Remote plasma sputtering 0 -1 -2 0 Magnetron sputtering after annealing 1000 3000 ZnO film thickness (nm) Very low stress is achieved 4 10 1.96 1.83 1.72 1.62 Ar : O2 flow ratio 1.53 35 1.45 García‐Gancedo, L., et al., Int. J. Nanomanufacturing, 7, 371 (2011) Extrinsic stress is considered negligible Hence stress observed is intrinsic Very low stress – low defect density – excellent film performance 2 FBARs characterisation ZnO characterisation • We have implemented the resonant spectrum method and determined the piezoelectric properties of a ZnO thin film sandwiched between two electrodes 0 -5 S 2 1 (d B ) -10 -15 -20 FEA of the FBARs’ deformation at resonance -25 Three parameters can be deduced based on data from the parallel and series resonant frequency spectra: density ρ, longitudinal acoustic velocity VL and the thickness mode electromechanical coefficient, kT. Dep. Method V (kg/m3) (m/s) (%) ALD 5625 6336 8.15 Mag. Sputt. 5610 6100 7.95 HiTUS 5673 6184 8.35 k t2 -30 0.8 1 1.2 1.4 1.6 1.8 Frequency (GHz) 2 2.2 2.4 Quality factors higher than 1500 were achieved Tracking the resonant frequency in real‐time Measurements set‐up IFBW 1000 IFBW 3000 Ball-bond Measured Data − Polynomia l Fit ─ Signal Ground case “O” ring seal earth top 50 Ω signal line. side IFBW 300 2 3 1 fitted (polyn omial) f0 measu red f0 SMA connector FBAR PCB board Bovine Serum Albumin (BSA) Mass Loading Frequency Shift (kHz) 250 holding screws Comparison sensitivities QCM/FBAR Comparison of responses from identical immuno‐ accumulations on 10MHz QCM and 1.7GHz FBAR FBAR resonating at 1.5 GHz wire bond 1 Quartz plate 200 150 Frequency changes were some three orders of magnitude greater than that of a QCM for a given BSA load 100 50 0 100 200 300 400 BSA concentraton (mg/ml) 500 600 FBAR has significantly better mass loading sensitivity! f f 0 f 02 m M 2 FBAR 3 Electrode Materials Fabricating CNT Electrodes • The electrode material also plays an important role in the FBARs response • Aluminium (Al), tungsten (W), gold (Au) and platinum (Pt) are the most common metals utilised as electrode materials • Carbon nanotubes (CNTs) possess low densities in the range of 1‐2 g cm‐3, electrical conductivities of up to 106 S m‐1 and exceptionally high elastic moduli (hence high acoustic impedance), usually higher than 1 TPa • Thus, thin films of interconnecting CNTs are potentially an excellent choice for the FBARs electrodes material 1) Iron (Fe) catalyst deposition using sputtering 2) Growth of Carbon Nanotubes using chemical vapour deposition (CVD) Catalyst Heat Heat + Gases Substrate Sputtering used to deposit catalyst Break up of catalyst into nanoislands Carbon Nanotubes growth using CVD Gases: 1) Ammonia (NH3) 2) Acetylene (C2H2) 3) Nitrogen (N2) Device Performance: Higher Frequency and Lower Loss Resonators with CNTs top electrode j 0.8j 0.8j 0 -5 0.5j S11 (dB) -10 (b) -15 0j -1 -20 Metal electrodes CNTs top electrode -25 -30 -35 1.7 1.72 -0.5 1 0j 0 -0.5j 1.74 1.76 1.78 Frequency (GHz) 1.8 -0.8j -0.8j -j Travelling waves at the surface of the FBAR membrane and produce energy losses and therefore a decrease on the Q factor. (a) (c) Finite Element Analysis of the Vibration Modes The travelling waves are greatly attenuated (although not completely eliminated) by the CNT electrodes CNT‐FBAR Biosensing Front-view of FBAR at resonance 3D-view of FBAR at resonance Frequency shift (MHz) 4 CNT electrodes 3 2 Metal electrodes 1 0 0 200 400 600 800 1000 BSA concentration (g/ml) 1200 Garcia‐Gancedo, L., et al. in 2010 International Ultrasonics Symposium 301 (2010) 4 Conclusions Sensitivity Sensitivity (minimum mass that we are able to detect) is ultimately limited by the smallest frequency shift we are able to measure. We are able to detect a mass in the order of 10-15 – 10-16 g. Frequency shift (MHz) 12 10 0.25 MHz cm2/ng • Higher sensitivity 8 6 0.14 MHz cm2/ng This is the best mass sensitivity reported to date 4 2 0 0 • There is a demand for high sensitivity biosensors for future generations of healthcare • Existing acoustic devices run at low frequencies (up to ~200 MHz) • FBAR Devices can operate at several GHz CNTs top electrode Cr/Au top electrode 20 40 60 BSA mass moad (ngcm-2) 80 This allows us to detect the presence of a single virus • Novel sputtering of ZnO yields a high Q‐factor • CNT electrodes gives enhanced sensitivity through higher frequency and lower losses • World‐leading biosensor technology capable of detecting mass down to below 10‐15 g • Project funding: EPSRC (EP/F063865/1) and EPSRC Pathways to Impact Cambridge Grant 5
© Copyright 2024