The Ultimate R&D Laser Pattern Generator MicroLab : A powerful Micro-Structure Fabrication Lab Multi‐Axis Laser Direct Writing System SVG‐4A100 SVG Optronics Introduction The MicroLab, SVG-4A100, a novel model of laser pattern generator or direct writing system with SLM(spatial light modulator) technology is designed to fabricate the precision patterns on the planar substrates and curved surfaces under the rectangular or polar coordinates. The minimum spot can be achieved to less than sub-wavelength to exposure step levels with binary phase structures for beam-shaper and micro-structure devices. Features SLM is the basis of a new photomask pattern generation technology that is fundamentally different from current production technologies. SLM technology unites laser productivity with e-beam´s high-resolution, creating a powerful photomask pattern generator with the potential to extend through many generations of technology. The almost outdated Pattern Generators use a system of raster scan technology, which are common today. These systems use a focused laser beam to write arbitrary microstructures with minimum features sizes down to 600 nm on almost any material. For structures smaller than 600 nm the latest method is the SLM technology offering a very high resolution, quality and throughput. Another method is E-Beam writing, but at the cost of a very slow write speed and a high cost of ownership. The stage with the mask blank moves continuously and the interferometer commands the laser to flash when it reaches the position for the next field. Because of the short flash time, the movement of the stage is frozen and a sharp image of the SLM is produced in the resist. The SLM is reloaded with a new pattern in time for the next flash. The pattern are stitched together from the fields. To write high quality microstructures down to 280 nm in a short time, a Maskless Laser Lithography System with SLM technology is most likely the right choice. It eliminates the turnaround time needed for the mask making process and makes it quick and easy to adjust a prototype design. The MicroLab is suitable to be used stand along under the rectangular or polar coordinates and has the benifit to shoot the high resolution patterns with time and cost-effective compared with e-beam lithography, by using UV laser and large NA objective. The MicroLab is suitable to fabricate the micro-optical devices, masks,CGH's, beam shapers, diffractive or refractive lens and lens array. The MicroLab has four axis controlling parameters (x-y-z-theta) to support for writing the patterns on the concave or convex surfaces with automatic focusing system. 维格光电 SVG Optronics, Co., Ltd. 478 Zhongnan Street, SIP, Suzhou 215026, China 2 Software MicroLab supports multiple exposure modes, such as grayscale lithography, vector writing, raster scanning and Flash tile beam lithography, leads to achieve unbelievable micro‐structures. Specifications Write mode (NA) 0.95 0.85 0.40 0.25 0.10 Address Grid (nm) 20 40 60 80 100 Feature size (μm) 0.30 0.40 1.0 2.0 4.0 Write Speed(mm2/min) 3 10 30 100 200 Edge Roughness (3s, nm) 40 50 70 70 280 CD Uniform (3s, nm) 50 60 80 80 300 Alignment accuracy (3s, nm) 100 120 150 200 400 Contact us SVG Optronics，Co. 478 Zhongnan Street, SIP, Suzhou 215026, China www.SVGoptronics.com Tel：86‐512‐62589170 Fax：86‐512‐62520928 [email protected] 维格光电 SVG Optronics, Co., Ltd. 478 Zhongnan Street, SIP, Suzhou 215026, China 3 Parameters format resolution Feature size XY scanning speed XY resolution XY repeat positioning CCD alignment CCD autofocusing Rotating speed Rotating accuracy Data format wavelength SLM Laser power size(L/W/H) weight Specifications 100mm×100mm (optional) 200nm 0.28 ~ 1um（#50），1 ~ 5um（#20），5 ~ 20um(#10) 25 mm/s 20nm 100nm 0.5um 0.3um 150°/s 0.001°/s DXF , GDSII , Gerber, ARR, BMP 405nm, or 351nm DMD1024 x 768 @10.8um 40mW ~ 100Mw, blue laser or UV laser 780mm×360mm×720mm ~150kg Examples and Applications MicroOptical Devices Fresnel and vector patterns Grating and Dot‐array 维格光电 SVG Optronics, Co., Ltd. 478 Zhongnan Street, SIP, Suzhou 215026, China 4 Micro‐lens and curve inspection Security images Optical Variable Devices 3D holograms Hexagonal and micro‐texts Micro mold Fabrication e‐paper micro‐cup 维格光电 SVG Optronics, Co., Ltd. 478 Zhongnan Street, SIP, Suzhou 215026, China 5 Bio‐chips and Fluids Micro‐structure materials Cylindrical array Micro‐chips RF Antenna RF MEMS Switch 维格光电 SVG Optronics, Co., Ltd. 478 Zhongnan Street, SIP, Suzhou 215026, China 6