1. technology and computing

Symposium in Advanced Deep Ultraviolet
Stepper Technology at DTU Danchip
October 23, 2013 from 9-13
Where: DTU Danchip, building 347 / seminarroom
Sign up by e-mail: [email protected]
Agenda
DTU Danchip, the National Center for Micro- and Nanofabrication,
has successfully installed a Deep Ultraviolet (DUV) Stepper. The
symposium will give an introduction to the tool and its capabilities
and offer the possibility to discuss projects and applications.
09:00-09:10
Welcome
Jörg Hübner, DTU Danchip
09:10-09:20
“Introduction to DUV stepper
technology”
Anders Jørgensen, DTU Danchip
09:20-10:05
“Using DUV stepper to manufacture
high efficiency transmission
gratings”
Thomas Rasmussen,
Ibsen Photonics
The tool was purchased by DTU Danchip in 2010 and process
development has been conducted in partnership with 3 Danish
companies: Ibsen, Capres and Accelink with financial support from
Højteknologifonden. During the past three years, the 3 companies
have respectively developed new individual products on the tool
using new lithography processes, developed in close collaboration
with DTU Danchip.
10:05-10:15
Break
10:15-10:45
”Field stitching with DUV stepper
for large area micropatterning –
experiential insights”
Rene Bergmann, DTU Nanotech
At this stage where the basic processes are established, the tool is
becoming increasingly interesting for a number of academic research
groups and companies in Denmark. The tool is now used for photonic
and electronic components in nanometer scale, i.e. nanostructured
surfaces, optical gratings, waveguides, fluid sensors, pressure
sensors and mass sensors.
10:45-11:30
“DUV Stepper and NanoImprint
tools”
Jesper Nørregard, NILT
11:30-12:15
“DUV stepper technology at
Danchip - Canon FPA-3000 EX4”
Matthias Keil, DTU Danchip
12:15-13:00
Lunch & networking
The tool is able to transfer structures with a critical dimension
down to 200 nm with an enormous speed; in one hour, it can
transfer nanostructures to more than 50 wafers of a diameter of
8”, corresponding to an area of 1.5 m2. The tool is thus interesting for
researchers allowing “large area” nanostruc¬tured devices as well
as for companies allowing rapid small-scale production of nanostructured components.
The DUV stepper is located in an ISO class 5 cleanroom with direct
access to robot handled cassette to cassette resist spinning and
resist development stations. Similar to all other tools in Danchip’s
cleanroom, the DUV Stepper Tool is accessible for properly trained
users with cleanroom access.
Symposium in Advanced Deep Ultraviolet
Stepper Technology at DTU Danchip
October 23, 2013 from 9-13
Ibsen: ”The DUV Stepper technology has expanded our toolbox for fabrication of diffraction
gratings” says Thomas Rasmussen, Vice President for Business Development, Sales and Marketing at Ibsen Photonics. He adds “we can now, with help of the Deep Ultraviolet Stepper Tool at
DTU Danchip, fabricate products with high efficiency covering a broader part of the visual spectrum, something that is not possible with our current technology. As a consequence of this, we
have already launched a commercial product, FREEDOM UV, an ultra-compact spectrometer for
measuring ultra violet light, and the product has been welcomed by our customers. Furthermore,
we now collaborate closely with DTU Danchip to use the Deep Ultraviolet Stepper to fabricate
large gratings for pulse-optimisation in high-power lasers, a very important market for us”.
Thomas Rasmussen, Vice President for Business Development, Sales and Marketing,
Ibsen Photonics A/S
Capres: ”Capres A/S develops and markets components and systems for conductivity measurements on high-technology materials. The key technologies are micro-scopic probes manufactured
by MEMS technology. Research and development of probes and metrology is done in-house and
through use of the clean room and process facilities at DTU Danchip.
Capres is faced with a continuous demand from its customers to develop and produce probes of
increasingly smaller size, and we are already now working in a region where traditional lithography
proves to be insufficient.
It is therefore of great interest to Capres that DTU Danchip will be able to provide services in
the area of nano lithography. This will affect Capres ability to do continued development at DTU
Danchip, and it could also facilitate pilot production and small scale production of Capres probes
at DTU Danchip.”
Henrik Bækbo, CTO, Capres A/S
Accelink “Accelink is one of only 6 fabs in the world that produces Photonic Lightwave Circuit
(PLC) based components. Several competitors already use Deep Ultra Violet (DUV) technology.
DUV is, at this point, too investment-heavy for Accelink alone. Despite the lack of DUV technology,
Accelink has achieved competitive cost efficiency by improving the existing process platform.
Applying DUV technology might further improve the position of Accelink on the market.”
Yueqiang Shen, CEO, Accelink Denmark A/S
DTU Danchip
Ørsteds Plads, Building 347
DK-2800 Kgs. Lyngby, Denmark
www.danchip.dtu.dk