OrmoClear10 and OrmoClear30 - micro resist technology GmbH
micro resist technology GmbH Köpenicker Straße 325, H1 12555 Berlin-Köpenick Germany Telephone +49 30 641670 100 Fax +49 30 641670 200 E-Mail [email protected] www.microresist.com NEW OrmoClear10 and OrmoClear30 Materials with high layer thickness for microoptics Process Opaque stamp Hybrid polymer drop or layer Unique features – Layer thickness up to 500 µm by spin coating (OrmoClear30) – Highly transparent for UV and visible light OrmoClear10 Circular micro structures width 1µm - 10 µm, length up to 120 µm Transparente substrate – Thermally and mechanically stable UV-exposure Applications – Production of micro-optical components Stamp detachment e.g. lenses, lens arrays – Single elements and wafer scale patterning OrmoClear10 Triangle structures edge length 16 and 8 µm Thermal treatment Technical data Film thickness [µm] OrmoClear30 Siemens star structure beginning at 1 µm 240 220 200 180 160 140 120 100 80 60 40 20 0 OrmoClear30 UV irradiation oxygen free ambient atmosphere 2000 Exposure dose broadband 1000 mJ cm-2 measured @ 365 nm Intrinsic rms roughness <5 nm CTE (20 – 100 °C) ~130 ppm K-1 Optical dispersion OrmoClear10 1000 up to 270 °C (short term) Thermal stability Spin speed curves 3000 4000 Spin speed [rpm] 5000 OrmoClear 10 OrmoClear 30 OrmoClear30 Gear wheel structures up to 200 µm diameter ls.11.08.18.01 31 µm (ambient atmosphere) 75 µm (ambient atmosphere) Refractive index 1.70 OrmoClear10 OrmoClear30 1.65 1.60 1.55 200 400 600 800 1000 Wavelength [nm] 1200 1400 1600
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