micro resist technology GmbH
Köpenicker Straße 325, H1
12555 Berlin-Köpenick
Germany
Telephone +49 30 641670 100
Fax +49 30 641670 200
E-Mail [email protected]
www.microresist.com
NEW
OrmoClear10 and OrmoClear30
Materials with high layer thickness for microoptics
Process
Opaque stamp
Hybrid polymer
drop or layer
Unique features
– Layer thickness up to 500 µm by
spin coating (OrmoClear30)
– Highly transparent for UV and visible light
OrmoClear10
Circular micro structures width 1µm - 10 µm,
length up to 120 µm
Transparente
substrate
– Thermally and mechanically stable
UV-exposure
Applications
– Production of micro-optical components
Stamp detachment
e.g. lenses, lens arrays
– Single elements and wafer scale
patterning
OrmoClear10
Triangle structures edge length 16 and 8 µm
Thermal treatment
Technical data
Film thickness [µm]
OrmoClear30
Siemens star structure beginning at 1 µm
240
220
200
180
160
140
120
100
80
60
40
20
0
OrmoClear30
UV irradiation
oxygen free
ambient atmosphere
2000
Exposure dose broadband
1000 mJ cm-2
measured @ 365 nm
Intrinsic rms roughness
<5 nm
CTE (20 – 100 °C)
~130 ppm K-1
Optical dispersion
OrmoClear10
1000
up to 270 °C
(short term)
Thermal stability
Spin speed curves
3000
4000
Spin speed [rpm]
5000
OrmoClear 10
OrmoClear 30
OrmoClear30
Gear wheel structures up to 200 µm diameter
ls.11.08.18.01
31 µm
(ambient atmosphere)
75 µm
(ambient atmosphere)
Refractive index
1.70
OrmoClear10
OrmoClear30
1.65
1.60
1.55
200
400
600
800
1000
Wavelength [nm]
1200
1400
1600