w w w . j e t al o n. c o m
CR-288
Concentration Monitor
Implementations
FEOL (Front End of Line): SC1, SC2, and HF
Summary: CR-288 enables real-time in-line highly precise monitoring of
SC1 (Ammonium Hydroxide and Hydrogen Peroxide), SC2 (Hydrochloric acid
and Hydrogen Peroxide), and HF (Hydrofluoric Acid) levels at front end of
line (FEOL) wafer processing.
Business Need: The temperature and concentration of SC1, SC2, and
The CR-288 concentration sensor features
materials and design compatible with
ultrahigh purity and caustic chemicals.
HF directly impact product yield. Process Engineers rely on grab samples
and laboratory analyses for information on liquid-chemical concentration
with a significant opportunity cost because this method is neither done in
real time nor continuously. Although it is accurate, it does not provide the
benefits of point of use (POU) sensors.
Contents
 Summary
 Business Need
 CR-288 Benefits
 Case Study: SC1 Blending
 Case Study: HF Testing
 Realized Performance Data
POU sensors allow liquid chemicals to be adjusted, controlled, and
monitored in-line, with immediate fault detection results. Tool failure modes
can be identified and addressed, resulting in increased tool uptime and
productivity. Liquid-chemical waste is reduced, lowering treatment and
disposal costs. To realize these benefits, the POU sensor must be highperformance, integrated easily, and reliable.
CR-288 Benefits
Because it measures temperature and concentration in-line, CR-288 offers
multiple benefits over other test methods. Specifically:
Jetalon Solutions Inc.
3343 Vincent Road,
Suite B
Pleasant Hill CA 94523
Phone: 925.274.1288
Fax: 800.878.2311
www.jetalon.com

Chemical concentrations are measured in real time at point of
use.

Chemical mixture concentrations are monitored and controlled
for each wafer in single wafer processing.

Batch-to-batch chemical consistency is monitored and
controlled for batch wafer processing.

The high degree of accuracy, simplified calibration, and
temperature corrections, enables greater process control with
a “set it and forget it” track record

The accuracy enables greater etch rate control for SEMI FEOL
and BEOL chemistry, increasing yield and decreasing waste.

The flowcell footprint is only 3” x 2” x 4” (l x w x h) and is
available in a variety of end connections providing flexible
installation options.
www.jetalon.com
Case Study: SC1 Blending
1.35110
SC1 Blender Repeatability
Hydrogen Peroxide + Ammonium Hydroxide
1.33400
1.33395
SC1 Index of Refraction
The SC1 and H2O2:NH4OH
mixture concentrations are
plotted as a function of time.
CR-288 resolution is better than
±0.005% by weight. The graph
illustrates the repeatability of
the SC1 blender (blue line) and
the repeatability of CR-288 to
measure the H2O2:NH4OH
mixture.
.
1.33405
1.35100
SC1: 40:80:1500
SC1: 40:80:1500
1.35090
1.33390
1.35080
1.33385
1.33380
1.35070
1.33375
1.35060
1.33370
1.35050
1.33365
1.35040
1.33360
SC1: 40:67.8:2300
SC1: 40:67.8:2300
1.33355
Hydrogen Peroxide/Ammonia Mix Index of Refraction
This graph demonstrates realtime measurements of
blending of SC1 Hydrogen
Peroxide (H2O2), Ammonium
Hydroxide (NH4OH), and water
(H2O).
1.35030
0.00
1.00
2.00
3.00
4.00
5.00
6.00
Time (minutes)
Case Study: HF Blending (500:1 and 50:1)
1.3332
1.3330
1.3328
1.3326
1.3324
Test HF blender Quick Start/ Stop
1.3322
Increase HF concentration to 50:1
Realized Performance
Data in weight %:
1.3320
SC1 resolution: ± 0.004%
1.3318
SC2 resolution: ± 0.004%
Blending Starts for 500:1 HF
H2O
CR-288 Index of Refraction
This graph demonstrates CR288’s capability to measure HF
(50:1) and HF (5001:1) blending.
CR-288 Index of Refraction is
plotted as a function of time for
HF (500:1) and HF (50:1)
blending. CR-288 measures the
entire range of HF from 49% to
HF (1000:1) with high resolution
and fast response time.
Blender PID Control Starts
0
200
400
600
800
1000
1200
Time (Seconds)
HF resolution: ± 0.004%
Jetalon Solutions Inc. 925-274-1288 CR-288 CS FEOL V1.0 © 2010
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